EVOLUTION II Wafer Automation is especially developed for the use of “inline” production control. It is corresponding to the clean room step 10. It has the following highlights:
Fully automated, integrated image analysis software for defect
recognition and mapping.
High performance acoustic scanning system with linear motion scanner, motorized z and acoustic auto focus.
20 mm high speed robot for wafer handling up to 200 mm.
Fully automated wafer chuck for wafer handling in water.
Up to 3 cassette load stations, drying unit.
Bar code reader and pre-aligner.
SECS interface for wafer fab communication. |
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